Applied Physics

Ion beam analysis


Ion beam analysis
Contact persons: Dan PANTELICA

Commissioned in 2012, the 3MV Tandetron particle accelerator allows running applicative as well as fundamental nuclear physics experiments and measurements. This machine was custom built by High Voltage Engineering B.V., the envisaged experiments being the IBA (Ion Beam Analysis) measurements, various topics in astrophysics, as well as ion implantation and material science.

Description

Ion Beam Analysis (IBA) provides an excellent way to probe atomic compositions and concentrations in various materials. The dynamic range of the elemental concentration is generous, almost all types of atoms within the probed material are identifiable with respect to concentration or depth profiles. IBA is an excellent tool in analysing a wide range of samples, from new materials, precious metal alloys, cultural heritage objects, biomaterials and biological samples to advanced materials like superlattices developed in nano-electronics.

Application domains
(material engineering, nano-electronics, ecology, medicine, cultural heritage, conventional and nuclear forensics, new materials)

The analytical techniques applicable at the 3MV Tandetron can offer precise information over the elemental composition and concentration or elemental distribution in atomic network and layers. With respect to this, the 3MV Tandetron can be used as a powerful tool in a wide range of research fields, as:

  • material engineering - where in order to highlight material deficiencies the study of breakdown zones can be performed;
  • nano-electronics - where the isolating membrane may be probed to study it's components and characteristics;
  • archaeometry - where a wide range of patrimony objects can be studied highlighting their principal constituents and trace elements highlighting the forgery tehniques;
  • forensics - where significant evidence may be collected by analysing the gunshot residues, or other materials registered as evidence;
  • nuclear forensics - where trace elements identified through IBA techniques can confirm the origin of the nuclear material;
  • ecology - where trace elements can provide information regarding pollution;
  • construction - where levels of chlorine can be identified in cement samples, preventing accelerated degradation in constructions;
  • biology, medicine - recent developments offer a very reliable way to probe biologic samples, in air or inert gas atmosphere.


    • Main advantages

    IBA techniques are characterized by high precision and reliability. In most cases, the samples don't need any chemical or physical preparation before analysis, fast direct analysis being available under vacuum conditions or outside the reaction chamber, in air or under He atmosphere measurement in order to improve precision of the results. The main advantage of this technique is considered to be its non-invasive profile, making it excellent for biological and fragile samples.

    Keywords

    Ion beam analysis, IBA, RBS, RBS-C, PIXE, PIGE, NRA, thin films, atomic analysis, material analysis, cultural heritage, forensics, medicine.

    Ion beam implantation


    Ion beam implantation
    Contact persons: Dan PANTELICA

    Description

    Ion beam implantation technology provides the most efficient way to insert dopants into different materials, especially crystalline materials in order to change their physical, chemical and electrical properties. As a cutting edge material engineering process, it allows creation of new nanostructures, atomic mixing or metal finishing. Our 3 MV Tandetron accelerator can be used as a high depth implanter that can implant nearly any type of atom species. If implantation is performed in crystalline structures, one can look for induced damage and perform crystal in-situ annealing. Another class of implantation experiments are focused on the particle irradiation of the biological cells coming from various tissues.

    Application domains

    Ion beam implantation can be used as a tool to enhance various properties in a wide range of materials. The entire process can lead to a completely new composite material characterized by fewer disadvantages with respect to the domain intended to be used. A few applications can be identified in:

  • material engineering - where certain properties can be enhanced or decreased through ion implantation, or the study of breakdown zones, in order to highlight material deficiencies;
  • nano-electronics - where electric conductivity may be improved after ion implantation, or the isolating membrane may be probed to study its components and characteristics.


    • Main advantages

    Ion beam implantation can be used to create new materials by impurities insertion or atomic mixing. The ion fluence can be precisely controlled and deployed at various selected depths. After implantation, the channeling-based analysis chamber be used for quality check control.

    Keywords

    Ion beam implantation, high energy implanter, ion implanter, crystal damage analysis, crystal regeneration.